Influence of initial oxygen on the formation of thiol layers
Leiro JA; Laiho T
Influence of initial oxygen on the formation of thiol layers
Leiro JA
Laiho T
ELSEVIER SCIENCE BV
Julkaisun pysyvä osoite on:
https://urn.fi/URN:NBN:fi-fe2021042714333
https://urn.fi/URN:NBN:fi-fe2021042714333
Tiivistelmä
In this study, X-ray photoelectron spectroscopy (XPS) has been used to study thin organic films. For comparison, monolayers were formed on clean and air-exposed metal substrates. Obtained results show that thiols remove contamination oxygen from gold, silver, platinum and copper surfaces. The tightly packed thiolate layers can be formed. In addition, oxygen does not take part in the final bonding of molecules to the surfaces. (c) 2005 Elsevier B.V. All rights reserved.
Kokoelmat
- Rinnakkaistallenteet [19207]